Jagxhiu, Jeton
(2000)
Mogućnosti primjene stohastičkog modela polutonskog polja u ofset tisku.
Diploma work - Pre-Bologna programme. Grafički fakutet. [Mentor: Bolanča, Stanislav].
Full text not available from this repository.
Item Type: |
Diploma work - Pre-Bologna programme
|
Mentor name: |
Bolanča, Stanislav |
Defence date: |
26 September 2000 |
Uncontrolled Keywords: |
ofset tisak, polutonska polja, raster |
Subjects: |
TECHNICAL SCIENCES > Graphic Technology |
Institution: |
Grafički fakutet |
City: |
Zagreb |
Number of Pages: |
33 |
Callnumber: |
bols 2000 jag |
Inventory number: |
D1092 |
Depositing User: |
Dora Budić
|
Status: |
Unpublished |
Date Deposited: |
10 Jun 2014 11:03 |
Last Modified: |
10 Jun 2014 11:03 |
URI: |
http://eprints.grf.unizg.hr/id/eprint/2015 |
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