Mogućnosti primjene stohastičkog modela polutonskog polja u ofset tisku

Jagxhiu, Jeton (2000) Mogućnosti primjene stohastičkog modela polutonskog polja u ofset tisku. Diploma work - Pre-Bologna programme. Grafički fakutet. [Mentor: Bolanča, Stanislav].

Full text not available from this repository.
Item Type: Diploma work - Pre-Bologna programme
Mentor name: Bolanča, Stanislav
Defence date: 26 September 2000
Uncontrolled Keywords: ofset tisak, polutonska polja, raster
Subjects: TECHNICAL SCIENCES > Graphic Technology
Institution: Grafički fakutet
City: Zagreb
Number of Pages: 33
Callnumber: bols 2000 jag
Inventory number: D1092
Depositing User: Dora Budić
Status: Unpublished
Date Deposited: 10 Jun 2014 11:03
Last Modified: 10 Jun 2014 11:03
URI: http://eprints.grf.unizg.hr/id/eprint/2015

Actions (login required)

View Item View Item